Chapter 5: Difference between revisions
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:*The channel has not been created (Enhancement) or is pinched off (Depletion & JFET). No current flows. |
:*The channel has not been created (Enhancement) or is pinched off (Depletion & JFET). No current flows. |
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*'''Triode:''' |
*'''Triode:''' |
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:*When <math>V_{to}</math> is reached, a channel forms beneath the gate (Enhancement) or is no longer pinched off (Depletion & JFET), allowing current to flow. |
:*When <math>v_{GS}=V_{to}</math> is reached, a channel forms beneath the gate (Enhancement) or is no longer pinched off (Depletion & JFET), allowing current to flow. |
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:*For small values of <math>v_{DS}</math>, <math>i_D</math> is proportional to <math>v_{DS}</math>. The device behaves as a resistor whose value depends on <math>v_{GS}</math>. '''Is this true for Depletion and JFET?''' |
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*'''Saturation:''' |
*'''Saturation:''' |
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:*When <math>v_{DG}=V_{to}</math> is reached, the channel thickness at the drain end becomes zero (Enhancement, Depletion & JFET). |
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:*"Now consider what happens if we continue to increase <math>v_{DS}</math>. Because of the current flow, the voltages between points along the channel and the source become greater as we move toward the drain. Thus, the voltage between gate and channel becomes smaller as we move toward the rain, resulting in a tapering of the channel thickness as illustrated in Figure 5.5. Because of the tapering of the channel, its resistance becomes larger with increasing <math>v_{DS}</math>, resuling in a lower rate of increase of <math>i_D</math>." <ref>Electronics p. 291</ref> |
:*"Now consider what happens if we continue to increase <math>v_{DS}</math>. Because of the current flow, the voltages between points along the channel and the source become greater as we move toward the drain. Thus, the voltage between gate and channel becomes smaller as we move toward the rain, resulting in a tapering of the channel thickness as illustrated in Figure 5.5. Because of the tapering of the channel, its resistance becomes larger with increasing <math>v_{DS}</math>, resuling in a lower rate of increase of <math>i_D</math>." <ref>Electronics p. 291</ref> |
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Revision as of 12:41, 21 March 2010
Metal-oxide semiconductor field effect transistor (MOSFET)
"The FET controls the flow of electrons (or electron holes) from the source to drain by affecting the size and shape of a "conductive channel" created and influenced by voltage (or lack of voltage) applied across the gate and source terminals (For ease of discussion, this assumes body and source are connected). This conductive channel is the "stream" through which electrons flow from source to drain."<ref>Wikipedia: Field-effect transistor http://en.wikipedia.org/wiki/Field-effect_transistor</ref>
- Enhancement: The electric field from the gate voltage forms an induced channel allowing current to flow.
- Depletion: The channel is physically implanted rather than induced.
- JFET: Charge flows through a semiconducting channel (between the source and drain). Applying a bias voltage to the gate terminal impedes the current flow (or pinches it off completely).
Talk about the irregular pinched off shape of a JFET. Insert a photo.
Threshold Voltage
- The threshold voltage, , is the minimum needed to move the transistor from the Cutoff to Triode region.
- is usually on the order of a couple of volts
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Modes of operation
- Cutoff
- The channel has not been created (Enhancement) or is pinched off (Depletion & JFET). No current flows.
- Triode:
- When is reached, a channel forms beneath the gate (Enhancement) or is no longer pinched off (Depletion & JFET), allowing current to flow.
- Saturation:
- When is reached, the channel thickness at the drain end becomes zero (Enhancement, Depletion & JFET).
- "Now consider what happens if we continue to increase . Because of the current flow, the voltages between points along the channel and the source become greater as we move toward the drain. Thus, the voltage between gate and channel becomes smaller as we move toward the rain, resulting in a tapering of the channel thickness as illustrated in Figure 5.5. Because of the tapering of the channel, its resistance becomes larger with increasing , resuling in a lower rate of increase of ." <ref>Electronics p. 291</ref>
Device equations
|
|
Region | (Enhancement/Depletion) |
(JFET) | |
---|---|---|---|
Cutoff | |||
Triode | |||
Saturation | |||
Boundry |
- Device Parameters:
- Surface Mobility: , the electrons in the channel
- Capacitance of the gate per unit area:
Pros and Cons
Transistor | Pros | Cons |
---|---|---|
MOSFET | Draws no gate current Infinite input resistance |
Gate protection needed to prevent static electricity from breaking down the insulation |
JFET | ||
BJT |
Analysis
- Analyze the DC circuit to find the Q-point (using nonlinear device equations or characteristic curves)
- Use the small-signal equivalent circuit to find the impedance and gains
Small-signal equivalent circuits
Insert photo
- "Transconductance, gm, is an important parameter in the design of amplifier circuits. In general, better performance is obtained with higher values of gm."<ref>Electroincs p. 310</ref>
- Transconductance is defined as .
- , where rd is the drain resistance
Type | Voltage Gain | Current Gain | Power Gain | Input Impedance | Output Impedance | Frequency Response |
---|---|---|---|---|---|---|
Common-Source | High | Low | ||||
Source Follower | ||||||
Common-Gate |
Questions
- How do you find rd?
- Roughly what are the breakdown voltages for JFETs?
- CMOS nand/nor gates
- JFET only goes to IDSS?
References
<references/>